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题名: Optical energy gap and microhardness of Cu3N thin films
作者: Yuan, XiaoMei; Liu, Tao; Zhang, XinHui; Yan, PX(闫鹏勋)
收录类别: EI
出版日期: 2013
会议名称: 2012 International Conference on Mechanics, Dynamic Systems and Material Engineering, MDSME 2012
会议日期: November 24, 2012 - November 25, 2012
会议地点: Guangzhou, China
英文摘要: The paper mainly reviewed the optical energy gap and microhardness of Cu3N thin films. The optical energy gap increases from 0.23 eV to 1.9 eV. The microhardness of Cu3N thin films was determined to be about 3.7-8.8 GPa. © (2013) Trans Tech Publications, Switzerland.
关键词: Energy gap ; Microhardness ; Solids ; Thin films ; Optical energy gap
作者部门: (1) Aircraft Ammunition Department of Air Force Logistics College, Xuzhou, Jiangsu, 221000, China ; (2) Institute for plasma and Metal Materials, Lanzhou University, Lanzhou 730000, China
通讯作者: Yuan, X. (yuanxm03@163.com)
学科分类: Mechanical Properties;Atomic and Molecular Physics; Materials Science
会议录: Advanced Materials Research
卷号: 625
页码: 277-279
出版者: TRANS TECH PUBLICATIONS LTD
出版地: Clausthal-Zellerfeld
语种: 英语
DOI: 10.4028/www.scientific.net/AMR.625.277
ISSN号: 1022-6680
EI记录号: 20130515966569
IR记录号: 20130515966569
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内容类型: 会议论文
URI标识: http://ir.lzu.edu.cn/handle/262010/184845
Appears in Collections:物理科学与技术学院_会议论文

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Recommended Citation:
Yuan, XiaoMei,Liu, Tao,Zhang, XinHui,et al. Optical energy gap and microhardness of Cu3N thin films[C]. 见:2012 International Conference on Mechanics, Dynamic Systems and Material Engineering, MDSME 2012. Guangzhou, China. November 24, 2012 - November 25, 2012.
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