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Facile fabrication of binder-free NiO electrodes with high rate capacity for lithium-ion batteries [期刊论文]
APPLIED SURFACE SCIENCE, 2016, 卷号: 368, 页码: 298-302
Gu, LL;  Xie, WH;  Bai, S;  Liu, BL;  Xue, S;  Li, Q;  He, DY(贺德衍)
View/Download:46/0
 
Enhanced visible-light photocatalytic activities and mechanism insight of BiVO4/Bi2WO6 composites with virus-like structures [期刊论文]
APPLIED SURFACE SCIENCE, 2015, 卷号: 355, 页码: 1107-1115
Xue, S;  Wei, ZW;  Hou, XY;  Xie, WH;  Li, SY;  Shang, XN;  He, DY(贺德衍)
View/Download:56/0
 
Low-temperature preparation of polycrystalline germanium thin films by Al-induced crystallization [期刊论文]
APPLIED SURFACE SCIENCE, 2012, 卷号: 258, 期号: 16, 页码: 6003-6006
Peng, SL(彭尚龙);  Hu, DK;  He, DY(贺德衍)
  |  View/Download:44/2
 
Broadband antireflection of silicon nanorod arrays prepared by plasma enhanced chemical vapor deposition [期刊论文]
APPLIED SURFACE SCIENCE, 2011, 卷号: 258, 期号: 3, 页码: 1058-1061
Wang, DS;  Yang, ZB;  Li, F;  Liu, DQ;  Wang, P(王鹏);  He, DY(贺德衍)
  |  View/Download:75/1
 
The microstructure and optical properties of crystallized hydrogenated silicon films prepared by very high frequency glow discharge [期刊论文]
APPLIED SURFACE SCIENCE, 2011, 卷号: 257, 期号: 20, 页码: 8350-8354
Wang, DS;  Yang, ZB;  Li, F;  He, DY(贺德衍)
  |  View/Download:42/0
 
Effect of Ar in the source gas on the microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD [期刊论文]
APPLIED SURFACE SCIENCE, 2010, 卷号: 257, 期号: 4, 页码: 1342-1346
Wang, DS;  Liu, QM;  Li, F;  Qin, YL;  Liu, DQ;  Tang, ZG;  Peng, SL(彭尚龙);  He, DY(贺德衍)
  |  View/Download:68/2
 
The optoelectronic properties of silicon films deposited by inductively coupled plasma CVD [期刊论文]
APPLIED SURFACE SCIENCE, 2010, 卷号: 257, 期号: 3, 页码: 817-822
Qin, YL;  Yan, HQ;  Li, F;  Qiao, L;  Liu, QM;  He, DY(贺德衍)
  |  View/Download:19/0
 
The effect of Ar flow rate in the growth of SiGe:H thin films by PECVD [期刊论文]
APPLIED SURFACE SCIENCE, 2010, 卷号: 256, 期号: 23, 页码: 7032-7036
Tang, ZG;  Wang, WB;  Wang, DS;  Liu, DQ;  Liu, QM;  Yin, M(尹旻);  He, DY(贺德衍)
  |  View/Download:36/1
 
The influence of H-2/(H-2 + Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD [期刊论文]
APPLIED SURFACE SCIENCE, 2009, 卷号: 255, 期号: 21, 页码: 8867-8873
Tang, ZG;  Wang, WB;  Zhou, B;  Wang, DS;  Peng, SL(彭尚龙);  He, DY(贺德衍)
  |  View/Download:49/2
 
Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition [期刊论文]
APPLIED SURFACE SCIENCE, 2008, 卷号: 255, 期号: 5, 页码: 1836-1840
Wang, Q(王琦);  Wang, CB;  Wang, Z;  Zhang, JY;  He, DY(贺德衍)
  |  View/Download:57/0
 

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