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Synthesis and light emission of fine and straight Si nanowires 期刊论文
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2008, 卷号: 10, 期号: 12, 页码: 3450-3453
Authors:  Wang, JX;  Yan, HQ;  Qin, YL;  Gao, PQ;  Li, JS(栗军帅);  Yin, M(尹旻);  Peng, SL(彭尚龙);  He, DY(贺德衍);  Wang, JX (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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Si nanowires  VLS  Chemical vapor deposition  HRTEM  Light emission  
Abnormal crystallization of silicon thin films deposited by ICP-CVD 期刊论文
CHINESE PHYSICS LETTERS, 2005, 卷号: 22, 期号: 12, 页码: 3130-3132
Authors:  Li, JS(栗军帅);  Yin, M(尹旻);  Wang, JX;  He, DY(贺德衍);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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Deposition and Growth Mechanism of Low-Temperature Crystalline Silicon Films on Inexpensive Substrates 会议论文
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, Incheon, SOUTH KOREA, SEP 28-OCT 02, 2008
Authors:  He, DY(贺德衍);  Yin, M(尹旻);  Wang, JX;  Gao, PQ;  Li, JS(栗军帅);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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Low-temperature crystalline Si films  Inductively coupled plasma CVD  Al-induced crystallization growth  Inexpensive substrates  
Columnar growth of crystalline silicon films on aluminium-coated glass by inductively coupled plasma CVD at room temperature 期刊论文
Chinese Physics B, 2009, 卷号: 18, 期号: 2, 页码: 773-777
Authors:  Wang, JX;  Qin, YL;  Yan, HQ;  Gao, PQ;  Li, JS(栗军帅);  Yin, M(尹旻);  He, DY(贺德衍);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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surface structure  columnar growth  inductively coupled plasma CVD  crystalline silicon films  
The effect of Ar flow rate in the growth of SiGe:H thin films by PECVD 期刊论文
APPLIED SURFACE SCIENCE, 2010, 卷号: 256, 期号: 23, 页码: 7032-7036
Authors:  Tang, ZG;  Wang, WB;  Wang, DS;  Liu, DQ;  Liu, QM;  Yin, M(尹旻);  He, DY(贺德衍);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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SiGe:H thin films  PECVD  Ar diluted gas  Optoelectronic properties  
Study on the initial growth process of crystalline silicon films on aluminum-coated polyethylene napthalate by Raman spectroscopy 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2007, 卷号: 308, 期号: 2, 页码: 330-333
Authors:  Li, JS(栗军帅);  Wang, JX;  Yin, M(尹旻);  Gao, PQ;  He, DY(贺德衍);  Chen, Q;  Li, YL(李亚丽);  Shirai, H;  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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micro-structural characterization  plastic substrates  Raman spectroscopy  transmission electron microscopy  chemical vapor deposition processes  crystalline silicon films  
Deposition and field emission properties of highly crystallized silicon films on aluminum-coated polyethylene napthalate 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2007, 卷号: 306, 期号: 1, 页码: 1-5
Authors:  Li, JS(栗军帅);  Wang, JX;  Yin, M(尹旻);  Gao, PQ;  He, DY(贺德衍);  Chen, Q;  Shirai, H;  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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atomic force microscopy  crystal morphology  surface structure  inductively coupled plasma CVD  Si films  field emission  
Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVD 期刊论文
ACTA PHYSICA SINICA, 2005, 卷号: 54, 期号: 1, 页码: 269-273
Authors:  Wang, XQ;  Li, JS(栗军帅);  Chen, Q;  Qi, J(祁菁);  Yin, M(尹旻);  He, DY(贺德衍);  Wang, XQ (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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ICP-CVD  Al-induced crystallization  Si thin films  low-temperature growth  
Electron field emission from nano-crystalline Si films deposited by inductively coupled plasma CVD at room temperature 期刊论文
CHINESE SCI BULL, 2006, 卷号: 51, 期号: 5, 页码: 510-514
Authors:  He, DY(贺德衍);  Wang, XQ;  Chen, Q;  Li, JS(栗军帅);  Yin, M(尹旻);  Karabutov, AV;  Kazanskii, AG;  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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ICP-CVD  nano-scale Si tips  electron field emission  low-temperature growth  
Highly crystallized silicon films grown on glass without amorphous incubation layers by inductively coupled plasma chemical vapor deposition 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2008, 卷号: 310, 期号: 19, 页码: 4340-4344
Authors:  Li, JS(栗军帅);  Wang, JX;  Yin, M(尹旻);  Gao, PQ;  Chen, Q;  Li, YL(李亚丽);  He, DY(贺德衍);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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