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兰州大学机构库
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Effects of the distance between the inductance coil and substrates on the microstructure and optical properties of silicon films deposited by ICP-CVD 会议论文
PROCEEDING OF THE FOURTH INTERNATIONAL CONFERENCE ON SURFACE AND INTERFACE SCIENCE AND ENGINEERING, Lanzhou, PEOPLES R CHINA, 2009
Authors:  Wang, JX;  Qin, YL;  Yan, HQ;  Gao, PQ;  Li, JS(栗军帅);  Yin, M(尹旻);  He, DY(贺德衍);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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Gas-phase transport  Microstructure  Inductively coupled plasma CVD  Raman spectroscopy  Scanning electron microscope  Optical band gap  
The effect of Ar flow rate in the growth of SiGe:H thin films by PECVD 期刊论文
APPLIED SURFACE SCIENCE, 2010, 卷号: 256, 期号: 23, 页码: 7032-7036
Authors:  Tang, ZG;  Wang, WB;  Wang, DS;  Liu, DQ;  Liu, QM;  Yin, M(尹旻);  He, DY(贺德衍);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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SiGe:H thin films  PECVD  Ar diluted gas  Optoelectronic properties  
Deposition and Growth Mechanism of Low-Temperature Crystalline Silicon Films on Inexpensive Substrates 会议论文
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, Incheon, SOUTH KOREA, SEP 28-OCT 02, 2008
Authors:  He, DY(贺德衍);  Yin, M(尹旻);  Wang, JX;  Gao, PQ;  Li, JS(栗军帅);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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Low-temperature crystalline Si films  Inductively coupled plasma CVD  Al-induced crystallization growth  Inexpensive substrates  
Low-temperature deposition of highly crystallized silicon films on Al-coated polyethylene napthalate by inductively coupled plasma CVD 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 卷号: 481, 期号: 1-2, 页码: 278-282
Authors:  Wang, JX;  Gao, PQ;  Yin, M(尹旻);  Qin, YL;  Yan, HQ;  Li, JS(栗军帅);  Peng, SL(彭尚龙);  He, DY(贺德衍);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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Crystalline silicon films  PEN substrates  Al layer  Raman spectroscopy  Scanning electron microscope  Inductively coupled plasma CVD  
Columnar growth of crystalline silicon films on aluminium-coated glass by inductively coupled plasma CVD at room temperature 期刊论文
Chinese Physics B, 2009, 卷号: 18, 期号: 2, 页码: 773-777
Authors:  Wang, JX;  Qin, YL;  Yan, HQ;  Gao, PQ;  Li, JS(栗军帅);  Yin, M(尹旻);  He, DY(贺德衍);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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surface structure  columnar growth  inductively coupled plasma CVD  crystalline silicon films  
Synthesis and light emission of fine and straight Si nanowires 期刊论文
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2008, 卷号: 10, 期号: 12, 页码: 3450-3453
Authors:  Wang, JX;  Yan, HQ;  Qin, YL;  Gao, PQ;  Li, JS(栗军帅);  Yin, M(尹旻);  Peng, SL(彭尚龙);  He, DY(贺德衍);  Wang, JX (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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Si nanowires  VLS  Chemical vapor deposition  HRTEM  Light emission  
Highly crystallized silicon films grown on glass without amorphous incubation layers by inductively coupled plasma chemical vapor deposition 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2008, 卷号: 310, 期号: 19, 页码: 4340-4344
Authors:  Li, JS(栗军帅);  Wang, JX;  Yin, M(尹旻);  Gao, PQ;  Chen, Q;  Li, YL(李亚丽);  He, DY(贺德衍);  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition 期刊论文
JOURNAL OF APPLIED PHYSICS, 2008, 卷号: 103, 期号: 4, 页码: -
Authors:  Li, JS(栗军帅);  Wang, JX;  Yin, M(尹旻);  Gao, PQ;  He, DY(贺德衍);  Chen, Q;  Li, YL(李亚丽);  Shirai, H;  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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Study on the initial growth process of crystalline silicon films on aluminum-coated polyethylene napthalate by Raman spectroscopy 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2007, 卷号: 308, 期号: 2, 页码: 330-333
Authors:  Li, JS(栗军帅);  Wang, JX;  Yin, M(尹旻);  Gao, PQ;  He, DY(贺德衍);  Chen, Q;  Li, YL(李亚丽);  Shirai, H;  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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micro-structural characterization  plastic substrates  Raman spectroscopy  transmission electron microscopy  chemical vapor deposition processes  crystalline silicon films  
Deposition and field emission properties of highly crystallized silicon films on aluminum-coated polyethylene napthalate 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2007, 卷号: 306, 期号: 1, 页码: 1-5
Authors:  Li, JS(栗军帅);  Wang, JX;  Yin, M(尹旻);  Gao, PQ;  He, DY(贺德衍);  Chen, Q;  Shirai, H;  He, DY (reprint author), Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China.
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atomic force microscopy  crystal morphology  surface structure  inductively coupled plasma CVD  Si films  field emission